OverviewResearch goal of the group is the development of mathematical methods for systems with bulk-interface processes for the
- thermodynamically consistent modeling of bulk-interface interaction with dissipative, Hamiltonian, and coupled dynamics,
- theory for the existence and qualitative properties of solutions,
- derivation and justification of interfacial processes and coupling conditions.
The analytical results form the basis for the development of numerical algorithms supporting simulations for applications with bulk-interface interaction.
Currently, the following applications are treated within the group:
- dissipative processes in elastic solids with bulk-interface interaction (M. Thomas), such as e.g. damage, fracture, plastification,
- optoelectronic processes in semiconductor devices (M. Thomas, D. Peschka),
- viscous flows with free boundaries and contact lines (D. Peschka).
|Mechanical stresses and progression of damage for a tension test with a notched bar using a BV-regularized damage model||Cross-section through a laser-device: The optically active germanium region displays the hole currents (colors) and the contour lines of the main mode (red lines)||P1 FEM solution of free boundary problem showing thin droplets sliding down an inclined plane|