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Algorithms for the solution of the semiconductor device equations in three dimensions with application to DEPFET sensor design

Collaborator: K. Gärtner

Cooperation with: R. Richter (Halbleiterlabor (Semiconductor Laboratory), Max-Planck-Institut für Physik, München, and Max-Planck-Institut für extra-terrestrische Physik, Garching)

Supported by: HP Integrity for Research Program

Description:

A short progress report is presented, for details, links, etc., compare WIAS Annual Report 2003 .

The focus is on algorithms and the X-ray sensor prototypes. Satellite-based X-ray astronomy and high energy physics are the primary applications. Detailed simulations of the detectors are necessary.


Fig. 1: ESA-XEUS project: A mirror satellite reflects X-rays into the detector satellite, distance 50 m to reach the spacial resolution
\ProjektEPSbildNocap{0.85\textwidth}{xeusp.eps}


The sensor design goals are:


The most interesting results 2004 are:

a)
Time integration added;
b)
2D computed doping profiles interpolated to 3D and
c)
Qualitative agreement of simulations and experiments for two prototype designs was reached.


We are in the position to start parameter variations to study the first amplifier stage in detail by solving the 3D problem on a very regular basis. The steps considered are:

  1. Depletion of the sensor volume;
  2. Removal of the electrons in the internal gate (clear process);
  3. Collection process of the electrons generated by a single interaction of one Mn K$\scriptstyle \alpha$ X-ray photon with the silicon crystal;
  4. Check of the ``read-out'' time (thermal generation creates electrons, too; these electrons limit the measurement time and force a new clear process).


Fig. 2: Detector chamber, the green areas are made up by millions of detector cells
\ProjektEPSbildNocap{0.9\textwidth}{teslap.eps}

Fig. 3: A computed detection processes (half-cell) is shown in the following sequence (n(t) - n(0), n(t) electron density):

1600 electrons created 50 ps (upper left), electrons move to the top 300 ps, 400 ps;

horizontal diffusion supported by small fields 1 ns, 3 ns, 10 $ \mu$s

\ProjektEPSbildNocap{0.9\textwidth}{3dbe_figA}


Fig. 4: Approximately 1296 electrons arrive at the internal gate and cause a potential (left) and a source contact current difference (right); contact current signals for different starting positions show the amplification per electron and the position-dependent losses at the clear contact.
\ProjektEPSbildNocap{0.9\textwidth}{3dbe_figB}



 [Next]:  Numerical investigation of the non-isothermal contact  
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LaTeX typesetting by H. Pletat
2005-07-29